发明名称 |
COPPER ELECTRODEPOSITION BATH CONTAINING AN ELECTROCHEMICALLY INERT CATION |
摘要 |
The present invention relates to an electrolyte composition for depositing copper on metal substrates. The composition contains a combination of two aromatic amines and an electrochemically inert cation. This electrolyte makes it possible to increase the copper nucleation density. It also allows bottom-up filling in trenches that have a very small opening dimension, typically lower than 40 nm. |
申请公布号 |
WO2015086180(A1) |
申请公布日期 |
2015.06.18 |
申请号 |
WO2014EP69324 |
申请日期 |
2014.09.10 |
申请人 |
ALCHIMER |
发明人 |
RELIGIEUX, LAURIANNE;BLONDEAU, PAUL;SUHR, DOMINIQUE |
分类号 |
C25D7/12;C25D3/38;H01L21/00;H05K3/00 |
主分类号 |
C25D7/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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