发明名称 method for manufacturing thin film transistors based on titanium oxides as active layer and thin film transistors thereof
摘要 <p>PURPOSE: A method for manufacturing a thin film transistors based on titanium oxides as an active layer and a thin film transistors thereof is provided to improve charge transfer and the stability of air and moisture by using a titanium oxide as an active layer. CONSTITUTION: An active layer(140) is formed on a substrate(110). An insulating layer(150) is formed on the active layer. The active layer is formed through one among a chemical vapor deposition, an organometallic chemical vapor deposition, an atomic layer deposition, a low pressure chemical vapor deposition, and a plasma enhanced chemical vapor deposition method. The active layer is formed with the organic compound including the titanium.</p>
申请公布号 KR101482944(B1) 申请公布日期 2015.01.16
申请号 KR20080075977 申请日期 2008.08.04
申请人 发明人
分类号 H01L29/786 主分类号 H01L29/786
代理机构 代理人
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