| 摘要 |
<p>The objective of the present invention is to provide a resist composition with improved LWR performance, CDU performance, defect inhibitory performance, applicability, and storage stability. The solution means of the present invention is a resist composition including a polymer having a unit structure including an acid-dissociable group, a radiative acid-generating material, and a solvent, wherein the solvent has a compound having a ketone carbonyl group and an alcoholic hydroxyl group. The alcoholic hydroxyl group is preferably tertiary. The solvent further preferably includes an alkylene glycol monoalkyl ether carboxylate compound.</p> |
