发明名称 |
PROGRAM FOR CORRECTING IRRADIATION POSITION OF CHARGE PARTICLE BEAM, COMPUTING DEVICE FOR CORRECTION AMOUNT OF IRRADIATION POSITION OF CHARGE PARTICLE BEAM, CHARGE PARTICLE BEAM IRRADIATION SYSTEM, AND METHOD FOR CORRECTING IRRADIATION POSITION OF CHARGE PARTICLE BEAM |
摘要 |
PROBLEM TO BE SOLVED: To provide a program for correcting an irradiation position of a charge particle beam, a computing device for a correction amount of an irradiation position of a charge particle beam, a charge particle beam irradiation system, and a method for correcting an irradiation position of a charge particle beam, by which an irradiation position of a charge particle beam can be accurately corrected and positional accuracy of a drawing pattern can be improved.SOLUTION: The program for correcting an irradiation position of an electron beam operates a control unit 22 to function as: charge density distribution computing means for regarding charges in a resist as surface charges on an interface of a resist R and a mask substrate M and computing a charge density distribution of the substituted surface charges; trajectory computing means for computing a trajectory of a charged particle based on the charge density distribution; error amount computing means for computing an error amount of an irradiation position of the electron beam based on the trajectory of the charged particle; and irradiation position correction amount computing means for computing a correction amount for the irradiation position of the electron beam based on the error amount. |
申请公布号 |
JP2014183098(A) |
申请公布日期 |
2014.09.29 |
申请号 |
JP20130055276 |
申请日期 |
2013.03.18 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
OKAWA YOHEI;OZAWA HIDENORI |
分类号 |
H01L21/027;H01J37/305 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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