| 摘要 |
A method and apparatus for removing native oxides from a substrate surface is provided. In one aspect, the chamber (100) comprises a chamber body (112) and a support assembly (300) at least partially disposed within the chamber body and adapted to support a substrate thereon. The support assembly includes one or more fluid channels (360) at least partially formed therein and capable of cooling the substrate. The chamber further comprises a lid assembly (200) disposed on an upper surface of the chamber body. The lid assembly includes a first electrode (240) and a second electrode (220) which define a plasma cavity therebetween, wherein the second electrode is adapted to connectively heat the substrate. |
