| 摘要 |
<P>PROBLEM TO BE SOLVED: To uniformly load a substrate even without improving a precision of a fixture to be used more than required. <P>SOLUTION: A method of manufacturing a pseudo phase matching element in which a crystal axis inversion region is periodically formed on a substrate 31 is provided. A pair of load applying fixtures 32a and 32b with which projecting portions 32aa and 32ba abutted to the substrate 31 are periodically formed which are disposed while facing each other with the substrate 31 therebetween in such a manner that the projecting portion 32ba formed in one load applying fixture 32b is positioned between the projecting portions 32aa formed in the other load applying fixture 32a. These paired loading fixtures 32a and 32b heated to a predetermined temperature apply a bending stress to the substrate 31 while holding the substrate 31 therebetween, thereby periodically forming the crystal axis inversion region on the substrate 31. Thus, even without producing projecting portions formed in load applying fixtures with high precision, a uniform load can be applied to the substrate. Furthermore, in comparison with a conventional method with which a compression load is operated on the substrate, the crystal axis inversion region can be formed on the substrate with a smaller load. <P>COPYRIGHT: (C)2012,JPO&INPIT |
