| 摘要 |
The present invention pertains to a vacuum deposition method for the surface of a product using vacuum equipment and, more specifically, to a method for gradational deposition using a vacuum device, which is characterized in that: a blocking member (7) is provided between a material (4) and a metal target (1) in a chamber (8) in a vacuum state, so that atoms (5) burst out from the metal target (1) are deposited on the material (4) in such a manner that the amount of deposited atoms gradually decrease from the edges of the blocking member (7) towards the center thereof by the interruption of the blocking member (7), when the metal target (1) is applied with a voltage. |
