| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive red-colored composition, having proper exposure sensitivity and developability, and capable of forming a pattern having a proper pattern profile, proper adhesion to a substrate, proper chemical and heat resistances and superior resoluiton, a color filter substrate and a translucent liquid crystal display. <P>SOLUTION: The photosensitive red-colored composition comprises at least a photopolymerizable monomer, a non-photosensitive resin and/or a photosensitive resin, a dispersant, a polymerization initiator, a polymerization inhibitor, a pigment and a solvent. A coating film of the photosensitive red-colored composition has exposure sensitivity behavior that ensures γ (contrast) of exposure sensitivity curve of ≥1.5 and without sensitivity at under exposure energy which is ≤30% of the minimum exposure energy yielding a residual film ratio after the development of ≥90%. <P>COPYRIGHT: (C)2007,JPO&INPIT |
