发明名称 |
SUBSTRATE TRANSFERING APPARATUS FOR CHAMBER SYSTEM AND CHAMBER SYSTEM THEREOF |
摘要 |
<p>PURPOSE: A substrate transferring apparatus for a chamber and the chamber system of the same are provided to improve the reliability and the reproducibility of deposition by easily controlling the exposing and transferring time of a substrate with respect to deposition source. CONSTITUTION: A base frame(110) includes a transferring track on a caterpillar track in a chamber. A substrate supporting unit is installed to be movable along the transferring track. A revolving unit(130) transfers the substrate supporting unit along the transferring track. A rotating unit rotates the substrate supporting unit by being connected with the revolting unit. A substrate fixing part sets a substrate and is supported by a supporting plate. A combining angle adjusting part sets the combining angle of the substrate fixing part.</p> |
申请公布号 |
KR20110072905(A) |
申请公布日期 |
2011.06.29 |
申请号 |
KR20090130016 |
申请日期 |
2009.12.23 |
申请人 |
KI-XIMAX. CO., LTD. |
发明人 |
KIM, KAB SEOG;KIM, YONG MO;CHOI, IL SIK |
分类号 |
H01L21/677;G02F1/13;H01L21/203 |
主分类号 |
H01L21/677 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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