发明名称 SUBSTRATE TRANSFERING APPARATUS FOR CHAMBER SYSTEM AND CHAMBER SYSTEM THEREOF
摘要 <p>PURPOSE: A substrate transferring apparatus for a chamber and the chamber system of the same are provided to improve the reliability and the reproducibility of deposition by easily controlling the exposing and transferring time of a substrate with respect to deposition source. CONSTITUTION: A base frame(110) includes a transferring track on a caterpillar track in a chamber. A substrate supporting unit is installed to be movable along the transferring track. A revolving unit(130) transfers the substrate supporting unit along the transferring track. A rotating unit rotates the substrate supporting unit by being connected with the revolting unit. A substrate fixing part sets a substrate and is supported by a supporting plate. A combining angle adjusting part sets the combining angle of the substrate fixing part.</p>
申请公布号 KR20110072905(A) 申请公布日期 2011.06.29
申请号 KR20090130016 申请日期 2009.12.23
申请人 KI-XIMAX. CO., LTD. 发明人 KIM, KAB SEOG;KIM, YONG MO;CHOI, IL SIK
分类号 H01L21/677;G02F1/13;H01L21/203 主分类号 H01L21/677
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