| 摘要 |
PROBLEM TO BE SOLVED: To provide an imprint lithography where resolution is greatly improved. SOLUTION: The imprint method includes applying imprint force to a template, thereby having an imprintable medium contact a target region on a first surface of a substrate, adding compensation force to a second surface of the substrate opposite to the first surface so as to reduce the distortion of the substrate caused by the application of the imprint force while applying the imprint force thereto, and separating the template from the imprinted medium, in order to form the imprint on the medium. COPYRIGHT: (C)2010,JPO&INPIT
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