发明名称 Control device and method for a substrate processing apparatus
摘要 A control device controls a substrate processing apparatus including a processing chamber for processing a substrate and a plurality of units for controlling a condition in the processing chamber. The control device includes a storing device for storing a return time required for each unit to be returned from an energy saving mode to a normal mode; a management device for obtaining a return start timing for each unit to be returned from the energy saving mode to the normal mode, based on the return time of each unit stored in the storing device; and a unit controller for independently controlling each unit to be returned from the energy saving mode to the normal mode, based on the return start timing of each unit obtained by the management device.
申请公布号 US7681055(B2) 申请公布日期 2010.03.16
申请号 US20070683090 申请日期 2007.03.07
申请人 TOKYO ELECTRON LIMITED 发明人 IIJIMA KIYOHITO
分类号 G06F1/26;G06F19/00;H01L21/02;H01L21/027 主分类号 G06F1/26
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