PHOTOSENSITIVE RESIN COMPOSITION, POLYMER COMPOUND, METHOD FOR PRODUCING PATTERN, AND ELECTRONIC DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of forming a hardened pattern or a hardened film, which is excellent in sensitivity, resolution and heat resistance; to provide a method for forming a pattern, which provides the pattern excellent in sensitivity, resolution and heat resistance and having a good shape by using the photosensitive resin composition; and to provide an electronic device which is reliable by forming the pattern having the good shape and good characteristics.

SOLUTION: The photosensitive resin composition is characterized by including: a polymer compound (a) obtained by reacting a monomer represented by general formula (1) with a monomer represented by general formula (2); and a photosensitive agent (b).

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