发明名称 AN INGOT DIAMETER CONTROLLING APPARATUS USING IN A SINGLE CRYSTALLINE SILICON INGOT AND SINGLE CRYSTAL INGOT GROWING METHOD
摘要 An ingot diameter controlling apparatus and an ingot growing method are provided to produce the diameter of the ingot accurately by compensating the diameter or changing the sensing region of a sensor according to a melt gap. A sensor unit(610) senses the property of the meniscus which is the contact surface of a growing ingot(670) and a silicon solution(660) of a quartz furnace(650). A compensation unit produces a diameter compensation value to compensate the diameter of the ingot according to the change of the melt gap. A diameter producing unit(620) produces the diameter of the ingot through the compensation value of the diameter by the compensation unit and the property of the meniscus sensed by the sensor unit. A controller(640) controls the diameter of the ingot based on the diameter of the ingot produced through the diameter producing unit.
申请公布号 KR20090070551(A) 申请公布日期 2009.07.01
申请号 KR20070138592 申请日期 2007.12.27
申请人 SILTRON INC. 发明人 SHIN, SEUNG HO;CHO, HYON JONG;MOON, JI HUN
分类号 C30B33/00;B28D5/00;C30B15/20 主分类号 C30B33/00
代理机构 代理人
主权项
地址