| 摘要 |
A substrate cleaning apparatus, a substrate cleaning method, and a recording medium are provided to exclude the need for a space for substrate inversion by cleaning a substrate in a state that a rear surface of the substrate is supported and held. A substrate cleaning apparatus includes a first substrate holding means(2), a second substrate holding means(3), a cleaning solution supply means, a dry means, and a cleaning member(5). The first substrate holding means horizontally absorbs and holds a first region of a rear surface of a substrate. The second substrate holding means horizontally absorbs and holds a second region of a rear surface of a substrate. The cleaning solution supply means supplies cleaning solution to the rear surface of the substrate absorbed and held in the first substrate holding means and the second substrate holding means. The dry means dries the second region of the rear surface of the substrate before the substrate is transferred from the first substrate holding means to the second substrate holding means. The cleaning member performs a cleaning operation to contact he rear surface of the substrate including the second region.
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