发明名称 INTERSPINOUS PROCESS IMPLANTS AND METHODS OF USE
摘要 Systems and method in accordance with an embodiment of the present invention can includes an implant comprising a first wing, a spacer extending from the first wing, and a distraction guide. The distraction guide is arranged in a first configuration to pierce and/or distract tissue associated with adjacent spinous processes extending from vertebrae of a targeted motion segment. The implant can be positioned between the adjacent spinous processes and once positioned, the implant can be arranged in a second configuration. When arranged in a second configuration, the distraction guide can act as a second wing. The first wing and the second wing can limit or block movement of the implant along a longitudinal axis of the implant.
申请公布号 US2008039947(A1) 申请公布日期 2008.02.14
申请号 US20070771087 申请日期 2007.06.29
申请人 ZUCHERMAN JAMES F;HSU KEN Y;WINSLOW CHARLES J;YERBY SCOTT A;FLYNN JOHN J;MITCHELL STEVEN T;MARKWART JOHN A 发明人 ZUCHERMAN JAMES F.;HSU KEN Y.;WINSLOW CHARLES J.;YERBY SCOTT A.;FLYNN JOHN J.;MITCHELL STEVEN T.;MARKWART JOHN A.
分类号 A61F2/44 主分类号 A61F2/44
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