| 发明名称 |
System and apparatus for real-time monitoring and control of sputter target erosion |
| 摘要 |
The present invention relates to a method and apparatus for real-time monitoring and controlling surface area erosion of a sputter target assembly utilized in a physical vapor deposition process.
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| 申请公布号 |
US2007017800(A1) |
申请公布日期 |
2007.01.25 |
| 申请号 |
US20050186974 |
申请日期 |
2005.07.22 |
| 申请人 |
CETINKAYA CETIN;PIGUR BJOERN;MATHEW RAJAN |
发明人 |
CETINKAYA CETIN;PIGUR BJOERN;MATHEW RAJAN |
| 分类号 |
C23C14/32;C23C14/00 |
主分类号 |
C23C14/32 |
| 代理机构 |
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代理人 |
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| 主权项 |
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