发明名称 METHOD FOR PREPARING A HIGH RESOLUTION PATTERN AND PRE-PATTERN FORMED SUBSTRATE BY THE METHOD
摘要 A high resolution pattern forming method and a substrate with a pre-pattern manufactured thereby are provided to reduce remarkably the waste of a high cost functional material and to enhance process efficiency. A sacrificial layer(30) made of a first material is formed on a substrate(10). A pattern groove with a predetermined CD(Critical Dimension) is formed on the resultant structure by patterning the sacrificial layer. A second material is filled in the pattern groove. A predetermined treatment is performed on the resultant structure to remove the remaining sacrificial layer. The predetermined treatment is performed using heat or light. A first threshold fluence of the first material is smaller than a second threshold fluence of the second material. The remaining sacrificial layer is removed by using a third threshold fluence.
申请公布号 KR20060117171(A) 申请公布日期 2006.11.16
申请号 KR20060004609 申请日期 2006.01.16
申请人 LG CHEM. LTD. 发明人 SHIN, DONG YOUN;KIM, TAE SU
分类号 H01L21/32 主分类号 H01L21/32
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