发明名称 |
METHOD FOR PREPARING A HIGH RESOLUTION PATTERN AND PRE-PATTERN FORMED SUBSTRATE BY THE METHOD |
摘要 |
A high resolution pattern forming method and a substrate with a pre-pattern manufactured thereby are provided to reduce remarkably the waste of a high cost functional material and to enhance process efficiency. A sacrificial layer(30) made of a first material is formed on a substrate(10). A pattern groove with a predetermined CD(Critical Dimension) is formed on the resultant structure by patterning the sacrificial layer. A second material is filled in the pattern groove. A predetermined treatment is performed on the resultant structure to remove the remaining sacrificial layer. The predetermined treatment is performed using heat or light. A first threshold fluence of the first material is smaller than a second threshold fluence of the second material. The remaining sacrificial layer is removed by using a third threshold fluence.
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申请公布号 |
KR20060117171(A) |
申请公布日期 |
2006.11.16 |
申请号 |
KR20060004609 |
申请日期 |
2006.01.16 |
申请人 |
LG CHEM. LTD. |
发明人 |
SHIN, DONG YOUN;KIM, TAE SU |
分类号 |
H01L21/32 |
主分类号 |
H01L21/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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