RADIATION SCANNING ARM AND COLLIMATOR FOR SERIES-PROCESSING SEMICONDUCTOR WAFER WITH RIBBON BEAM

摘要

PROBLEM TO BE SOLVED: To provide a hybrid scan type ion implantation device processing a single wafer, capable of uniformly injecting and having a simple structure, excellent durability and reliability. SOLUTION: A wafer is mounted on a wafer holder 120 attached to an end of an arm 110 connected with a first pivot 150 and bent midway by a second pivot 140. The wafer is tilted by an arbitrary angle with the second pivot and mechanically scanned in a circular arc shape by the first pivot. A ribbon beam 20 whose current density is proportional to the distance from the first pivot is formed with a collimator to irradiate the wafer to achieve uniform injection. COPYRIGHT: (C)2007,JPO&INPIT