发明名称 Method for synthesizing polymeric material, method for forming polymer thin film and method for forming interlayer insulating film
摘要 A Lewis acid-base reaction is caused, in a solution, between a first monomer corresponding to a Lewis acid and a second monomer corresponding to a Lewis base, so as to generate a monomer adduct in which the first monomer and the second monomer are bonded to each other through weak electric interaction. Next, the solution including the monomer adduct is applied on a substrate so as to form a supramolecular solid thin film made of the monomer adduct. Then, the supramolecular solid thin film is heated so as to cause a polymerization reaction between the first monomer and the second monomer within the supramolecular solid thin film, thereby forming a polymer thin film.
申请公布号 US2005245097(A1) 申请公布日期 2005.11.03
申请号 US20050177569 申请日期 2005.07.11
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 AOI NOBUO
分类号 C08G73/10;C08J5/18;H01L21/312;(IPC1-7):A61K9/50;H01L21/31 主分类号 C08G73/10
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