| 摘要 |
A method for fabricating a TFT array substrate for a liquid crystal display device is provided. The method includes: preparing a substrate; forming a gate line on the substrate using a first etchant; forming an insulation layer on the gate line; forming a semiconductor layer on a portion of the insulation layer; forming a test line on the insulation layer and source and drain electrodes on the semiconductor layer; forming a passivation layer having passivation hole to expose a portion of the gate line on the substrate; and forming a pixel electrode on the passivation layer by applying a second etchant including HNO<SUB>3</SUB>, a ferric compound, HClO<SUB>4 </SUB>and flouro compound. |
