发明名称 ARRAY SUBSTRATE OF THIN FILM TRANSISTOR FORMING AT LEAST ONE PROTRUSION ON GATE LINE AND METHOD FOR MANUFACTURING THE SAME
摘要 PURPOSE: An array substrate of thin film transistor and a method for manufacturing the same are provided to prevent an exposure of a semiconductor pattern from a backlight by forming at least one protrusion in a gate line. CONSTITUTION: A gate electrode of a thin film transistor comprises a gate line(102). A data line(104) crosses the gate line and a gate dielectric. A source electrode(110) is connected with the data line. A drain electrode(112) faces to the source electrode. A semiconductor layer forms a channel between the source electrode and the drain electrode. A pixel(118) electrode is connected with the drain electrode through a contact hole of a protective layer.
申请公布号 KR20050019625(A) 申请公布日期 2005.03.03
申请号 KR20030057517 申请日期 2003.08.20
申请人 LG.PHILIPS LCD CO., LTD. 发明人 TAK, JI TAE
分类号 H01L29/786;(IPC1-7):H01L29/786 主分类号 H01L29/786
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