| 发明名称 |
Organometallic compounds |
| 摘要 |
Organometallic compounds suitable for use as vapor phase deposition precursors for Group IV metal-containing films are provided. Methods of depositing Group IV metal-containing films using certain organometallic precursors are also provided. Such Group IV metal-containing films are particularly useful in the manufacture of electronic devices.
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| 申请公布号 |
US2004194703(A1) |
申请公布日期 |
2004.10.07 |
| 申请号 |
US20040817618 |
申请日期 |
2004.04.02 |
| 申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. |
发明人 |
SHENAI-KHATKHATE DEODATTA VINAYAK;POWER MICHAEL BRENDAN |
| 分类号 |
C07C391/00;C07C395/00;C07F7/08;C07F7/30;C23C16/18;C23C16/28;C23C16/30;H01L21/205;(IPC1-7):C23C16/00;C08F4/44 |
主分类号 |
C07C391/00 |
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