发明名称 APPARATUS FOR SUPPLYING SOURCE GAS BY CONTROLLING AUTOMATICALLY OPERATIONS OF VALVE UNIT
摘要 PURPOSE: An apparatus for supplying a source gas is provided to prevent a process accident and leakage of a source gas by controlling automatically operations of a valve unit for connecting tubes to a container. CONSTITUTION: A container(202) is used for storing a liquid source. The first tube is extended into the stored liquid source in order to form a source gas by bubbling a carrier gas within the liquid source. The second tube(212) is connected to the container in order to supply the carrier gas and the source gas to a process chamber. A valve unit(204) is installed at the first and the second tubes in order to connect the first tube to the second tube. The third tube(216) is connected to the first tube in order to supply the carrier gas. The fourth tube is used for connecting the second tube to the process chamber. A controller(250) is used for controlling operations of the valve unit.
申请公布号 KR20040079469(A) 申请公布日期 2004.09.16
申请号 KR20030014270 申请日期 2003.03.07
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 AHN, BYEONG HO;HWANG, GI HYEON;JU, YONG GYU
分类号 H01L21/20;(IPC1-7):H01L21/20 主分类号 H01L21/20
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