DEVICE AND METHOD FOR THE ELECTRON BEAM ATTENUATION OF REACTIVELY FORMED LAYERS ON SUBSTRATES

摘要

The invention relates to a device and method for the electron beam attenuation of reactively formed layers on substrates in a vacuum. The aim of the invention is to increase the efficiency compared to conventional solutions and to improve the quality of the reactively formed layers. To these ends, the invention provides that both a crucible containing a chemical element as well as a substrate to be coated are provided inside a vacuum chamber, and an electron beam source is provided on said vacuum chamber. A shield with an aperture opening, through which the produced vapor can reach the substrate, is placed between the crucible containing the chemical element and the substrate. The shield protects at least one element for exciting, dissociating and/or ionizing a reactive gas, which is introduced via at least one gas inlet protectively arranged between the substrate and the shield.