| 摘要 |
The invention provides a method for fabricating diffusive-type light reflector which is a substrate having a plurality of bumpy elements with reflective curved surfaces. Each of the plurality of bumpy elements has a first surface and a second surface, the first angle (alpha or theta) between the first surface and the substrate is different from the second angle (beta or phi) between the second surface and the substrate. A slit-width-adjusting mask is proposed for manufacturing the curved reflective elements in one exposing step according to the present invention. The slit-width-adjusting mask includes a plurality of slit areas. The first transparent slit area under defocus exposure has the first exposure p1, and the second transparent slit area has the second exposure q1. Each transparent slit area has the same area and is of the width p2, the first transparent slit area is of the width p2, and the second transparent slit area has the width q2. The first exposure p1 is greater than the second exposure q1, and (q2)/(p2)=(q1/(p1). The invention can also be used in a diffusive-type light reflector TFT-LCD, as the reflector element between the liquid crystal layer and the active matrix.
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