发明名称 IMPEDANCE MATCHING DEVICE WITH LOAD EFFECTIVE POWER MEASUREMENT FUNCTION
摘要 PROBLEM TO BE SOLVED: To accurately measure an effective power consumption of a plasma chamber load by using a circuit component value of an impedance matching device. SOLUTION: The impedance matching device is inserted between a high frequency power supply whose internal impedance Z0 is known and a plasma chamber load 3. The impedance matching device has a first variable reactance 1 for adjusting amplitude and a second variable reactance 2 for phase adjustment, and controls the respective reactance values depending on the detected value of a phase detection and amplitude detection section 6 to match them with the load impedance. The impedance matching device is also provided with a power arithmetic means that calculates the power impedance viewed from an output terminal (Out) of the impedance matching device, decides a load impedance Zc=R±jX by using its conjugate impedance, calculates a power factor Cosθ=R/√(R<2> +X<2> ) and calculates an effective power consumed by a high frequency load by using a formula P=VICosθobtained by multiplying the product of a voltage effective value V and a current effective value I at a load input terminal by the power factor Cosθ.
申请公布号 JP2003046359(A) 申请公布日期 2003.02.14
申请号 JP20010235090 申请日期 2001.08.02
申请人 ADTEC PLASMA TECHNOLOGY CO LTD 发明人 FUJII SHUITSU
分类号 H01L21/302;G05F1/66;H01L21/3065;H03H7/40;(IPC1-7):H03H7/40;H01L21/306 主分类号 H01L21/302
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