| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing an EL element wherein failures of a film thickness unevenness of a light emitting part or a film-forming fault or the like can be evaded when plural light emitting parts are formed while having advantages by a photolithographic method. SOLUTION: The method has a process in which a coating solution for the first light-emitting layers is coated on the first substrate 1 wherein an electrode layer 2 is formed, a process in which a photoresist 4 is coated on the first light-emitting layer 3, a process in which patterning is carried out so that a photoresist layer of a part where the first light emitting part is formed is remained, a process in which the first light emitting part 3' having a photoresist layer 4 on the surface is formed by removing the first light-emitting layer of the part where a photoresist layer is removed, a process in which the second light-emitting layer 7 is formed by coating the coating solution for the second light-emitting layer on this part, and a process in which peeling off the photoresist layer 4 to remain on the first light emission part 3' together with the second light-emitting layer 7 formed on this part.
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