MASK, MANUFACTURING METHOD OF MASK, MANUFACTURING METHOD OF ORGANIC ELECTROLUMINESCENT EQUIPMENT, AND ORGANIC ELECTROLUMINESCENT EQUIPMENT

摘要

PROBLEM TO BE SOLVED: To provide a mask which can form a thin film pattern constituting pixels of an organic EL element in accuracy which can correspond to highly minute pixels. SOLUTION: Performing anisotropic wet etching using crystal orientation dependence using a silicon wafer (a single-crystal silicon substrate) 1 whose face direction is (100), forms penetrating holes 11, whose wall surfaces 11a have face directions of (111), as opening parts correspond to the thin film pattern made to form.