发明名称 |
Heat treatment apparatus having a thin light-transmitting window |
摘要 |
A quartz window decreases an amount of absorption of heat from a heat source while maintaining a pressure difference between the pressure inside a process chamber and an atmospheric pressure. The process chamber defines a process space for processing an object to be processes. A placement stage is provided in the process chamber so as to place the object to be processed thereon. A gas supply part which supplies to the process chamber a process gas for processing the object to be processed. The quartz window is provided as a part of the process chamber so that the quartz window is opposite to the object to be processed placed on the placement stage. A heating unit has a heat radiation lamp provided on an opposite side of the process chamber with respect to the light-transmitting window. The quartz window constitutes a convex lens part which is formed on a periphery of the quartz window and protrudes into the process space.
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申请公布号 |
US6437290(B1) |
申请公布日期 |
2002.08.20 |
申请号 |
US20010930495 |
申请日期 |
2001.08.16 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
SHAO SHOUQIAN;LI YICHENG;SHIGEOKA TAKASHI;SAKUMA TAKESHI |
分类号 |
C23C16/48;C30B25/10;C30B31/12;(IPC1-7):H05B5/14 |
主分类号 |
C23C16/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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