| 摘要 |
PROBLEM TO BE SOLVED: To reduce irregularities of exposure amount in a contact part between an exposure by a first scanning and an exposure by a second scanning. SOLUTION: The device has an illumination system for transferring a reticle pattern formed in a reticle 3, which is an original film on a wafer 5 as a photosensitive body by a laser light source 1, a diaphragm 2 for setting an illumination region by the laser light source 1 and a mechanism for scanning synchronously the reticle 3 and the wafer 5 in a prescribed scanning direction. It is provided with a diaphragm driving mechanism for carrying out exposure, while driving the diaphragm 2 for setting an illumination region in a direction vertical to a scanning direction on a plane vertical to an optical axis of the illumination system during the synchronous scanning of the reticle 3 and the wafer 5, when a transfer pattern wherein each exposure region is connected is formed on the wafer 5 by repeated exposures through synchronous scanning of the reticle 3 and the wafer 5 and relative movement of the wafer 5 with respect to a direction crossing the scanning direction.
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