发明名称 SUBSTRATE-PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To enable a larger number of substrate-processing chambers to be installed for restraining a substrate-processing apparatus from increasing in dedicated occupancy area as a whole. SOLUTION: Two transfer chambers 11 and 12 equipped with transfer robots 51 and 52, which transfer substrates 9 inside respectively are connected together direct through the intermediary of a gate valve between the processing chambers 21, 22, 23, 24, and 25 and a load chuck chamber 3, where mooring pieces 61 and 62 which moor the substrates 9, are provided inside the transfer chambers 11 and 12 respectively. The mooring pieces 61 and 62 are each composed of four stays, which are provided 90 deg. apart from each other on the circumference around a center concentric with the center axis of the chamber 11 or 12. The arms of the transfer robots 51 and 52 are each composed of four arm rods and are capable of descending lower than the upper edge faces of the mooring pieces 61 and 62, without interfering with the mooring pieces 61 and 62. The transfer robots 51 and 52 make their arms ascend, to place the substrate 9 on an end effector and rotate around a rotary axis which is concentric with the center axes of the transfer chambers 11 and 12 above the upper edge faces of the mooring pieces 61 and 62.
申请公布号 JP2001189365(A) 申请公布日期 2001.07.10
申请号 JP19990373612 申请日期 1999.12.28
申请人 ANELVA CORP 发明人 OGUCHI TOSHIAKI;TAKAHASHI NOBUYUKI
分类号 B65G49/07;C23C14/34;C23C16/44;H01L21/203;H01L21/205;H01L21/302;H01L21/3065;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 B65G49/07
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