发明名称 SEMICONDUCTOR DISTORTION SENSOR AND ITS MANUFACTURE, AND SCANNING PROBE MICROSCOPE
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor strain sensor, capable of detecting the deflection amount of a probe with high sensitivity by forming a p-n junction or a bipolar transistor, which is a semiconductor junction, in a deflecting part of the probe composed of a semiconductor substrate. SOLUTION: A probe 10 is composed of a cantilever arm part 10a and a support part 10b, and a tip end 10c of the cantilever arm part 10a is provided with a probe. A semiconductor junction 9 is formed in the vicinity of the surface of the root part of the arm part 10a. As a semiconductor junction, a p-n junction or a bipolar transistor is provided. A thin film 8 (an insulation film 40) regularly adding stresses to the semiconductor junction 9 of the cantilever is provided for enhancing the detection sensitivity.
申请公布号 JPH11304825(A) 申请公布日期 1999.11.05
申请号 JP19980252972 申请日期 1998.09.07
申请人 SEIKO INSTRUMENTS INC 发明人 TAKAHASHI HIROSHI;MICHEL DESPONT;SHIMIZU NOBUHIRO;SHIRAKAWABE YOSHIHARU
分类号 G01B21/30;G01B7/16;G01B7/34;G01N37/00;G01Q60/38;H01L29/84;(IPC1-7):G01N37/00 主分类号 G01B21/30
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