| 摘要 |
After a mask (12) and a substrate (16) have been scanned as one unit relative to exposure light (32) to expose a predetermined area on the substrate (16), the mask (12) is stepped in a direction parallel but opposite to the scanning direction. Thereafter, the mask (12) and the substrate (16) are scanned as one unit again to expose another area on the substrate (16). Thus, throughput is improved when a large-sized substrate is divisionally exposed.
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