| 摘要 |
PURPOSE:To detect and eliminate fine particles on wafer without damaging the wafer. CONSTITUTION:Sublimable sulfur film 13 is piled on a base plate 11 and particles 12 are detected by appearing the particles to detect the existence and distribution of the particles. After the detection, the sulfur film 13 is sublimated and eliminated by heating and the detection is done without destruction.
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