发明名称 WAFER VACUUM-SUCKING DEVICE
摘要 <p>PURPOSE:To accurately hold a wafer (with high flatness) by vacuum suction without bending moment due to irregular vacuum-suction force of a wafer vacuum-sucking device and without deformation of the wafer due to adherence of a foreign matter. CONSTITUTION:A wafer vacuum-sucking device comprises a wafer outer periphery rim 1 and a hole periphery rim 2 for holding in contact with a wafer 5 with sealability with the atmosphere on the same surface as a board 4 made of ceramic as a base material, and a vacuum fitting 7 formed of a columnar protrusion 3 for holding in contact with the wafer 5 to pipe with a vacuum passage 6 for evacuating in vacuum the wafer 5.</p>
申请公布号 JPH05326677(A) 申请公布日期 1993.12.10
申请号 JP19920123236 申请日期 1992.05.15
申请人 HITACHI LTD;HITACHI INSTR ENG CO LTD 发明人 TSUNODA MASAHIRO;MATSUZAKA HIDETOSHI
分类号 B25J15/06;B65G49/07;H01L21/027;H01L21/30;H01L21/677;H01L21/68;H01L21/683;(IPC1-7):H01L21/68 主分类号 B25J15/06
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