发明名称 |
WAFER VACUUM-SUCKING DEVICE |
摘要 |
<p>PURPOSE:To accurately hold a wafer (with high flatness) by vacuum suction without bending moment due to irregular vacuum-suction force of a wafer vacuum-sucking device and without deformation of the wafer due to adherence of a foreign matter. CONSTITUTION:A wafer vacuum-sucking device comprises a wafer outer periphery rim 1 and a hole periphery rim 2 for holding in contact with a wafer 5 with sealability with the atmosphere on the same surface as a board 4 made of ceramic as a base material, and a vacuum fitting 7 formed of a columnar protrusion 3 for holding in contact with the wafer 5 to pipe with a vacuum passage 6 for evacuating in vacuum the wafer 5.</p> |
申请公布号 |
JPH05326677(A) |
申请公布日期 |
1993.12.10 |
申请号 |
JP19920123236 |
申请日期 |
1992.05.15 |
申请人 |
HITACHI LTD;HITACHI INSTR ENG CO LTD |
发明人 |
TSUNODA MASAHIRO;MATSUZAKA HIDETOSHI |
分类号 |
B25J15/06;B65G49/07;H01L21/027;H01L21/30;H01L21/677;H01L21/68;H01L21/683;(IPC1-7):H01L21/68 |
主分类号 |
B25J15/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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