发明名称 SYSTEM AND METHOD FOR WASHING AND DRYING
摘要 <p>PURPOSE: To automatically quickly clean and dry an object, such as the wafer, substrate, mask, disk, etc., by providing an attachable/detachable and quickly exchangeable bowl and an attachable/detachable small piece collector. CONSTITUTION: A cleaning and drying system 10 incorporates a bowl 12 for cleaning which is attached to an attaching plate 14 and can be quickly and easily removed and exchanged. Knobs 16-22 which carry spiral grooves formed on their internal surfaces and can be released quickly are fixed to the plate 14. A DC driving motor 24 is fixed to the plate 14 and rotates a cassette rotor 26 in the attachable/detachable bowl 12. As the rotor 26, a wafer 32, and a cassette 34 rotate, pressurized demineralized water, fluid, etc., is led to the bowl 12 from the wafer 32 housed in a cassette 34 through a deionized water atomizing manifold 28 for pressure-cleaning used for chemical treatment. An attachable/detachable collector 108 which collects small pieces and particles is provided below the plate 14 and united with a manifold 106 for exhaust gas.</p>
申请公布号 JPH01125936(A) 申请公布日期 1989.05.18
申请号 JP19880107475 申请日期 1988.04.27
申请人 SEMITSUULE CORP 发明人 REIMON EFU TONPUSON;AREKUSANDAA OUKUZARUTSU
分类号 H01L21/304;B08B3/02;G03F1/08;H01L21/00 主分类号 H01L21/304
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