Method and apparatus for the manufacture of superconducting oxide materials.

摘要

A sputtering apparatus for producing a thin film of a superconducting oxide material comprises a pair of sputter targets of compacted superconducting material which are mutually separated and opposed to each other so as to define a region wherein a substrate which is required to be coated with sputtered material may be located, and means for subjecting such substrate to the action of a magnetic field oriented perpendicular to or parallel with the substrate surface whereby crystal orientation is caused to occur during the growth of the film.