发明名称 |
Use of supercritical fluid to dry wafer and clean lens in immersion lithography |
摘要 |
Disclosed are immersion lithography methods and systems involving irradiating a photoresist through a lens and an immersion liquid of an immersion lithography tool, the immersion liquid in an immersion space contacting the lens and the photoresist; removing the immersion liquid from the immersion space; charging the immersion space with a supercritical fluid; removing the supercritical fluid from the immersion space; and charging the immersion space with immersion liquid.
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申请公布号 |
US7262422(B2) |
申请公布日期 |
2007.08.28 |
申请号 |
US20050173257 |
申请日期 |
2005.07.01 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
SUBRAMANIAN RAMKUMAR;SINGH BHANWAR;PHAN KHOI A. |
分类号 |
G03C5/00 |
主分类号 |
G03C5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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