Oxidn-resistant chromium-aluminium alloy film resistor prodn - by vacuum vapour phase deposition

摘要

In the prodn. of oxidn-resistant resistance material for discrete or integrated electric film resistors by vacuum vapour phase deposition with an electron beam 2-component evaporator onto an insulating substrate, the substrate is heated to max. 530 degrees C and Cr and max. 55 atom % Al are deposited on this. A relatively small amt. of Fe or Zn can also be deposited. The films have the good properties of familiar Cr-Ni alloy films but are more resistant to oxidn. and hence can be loaded more heavily. The third alloy constituent (Fe or Zn) favours the formation of a very dense protective Al2O3 film on the surface, so that any slight internal oxidn. in pure Cr-Al films can be suppressed.