发明名称 Method of manufacturing substrate for display and method of manufacturing display utilizing the same
摘要 The invention relates to a method of manufacturing a substrate for a display and a method of manufacturing a display, and it is aimed at providing a display which has high luminance and which can achieve high display quality. A method of manufacturing a substrate for a display is provided in which an insulation film is formed on a gate bus line; a gate bus line terminal is formed on the insulation film; a protective film is formed on the gate bus line terminal; a resist layer formed on the projective film is patterned to form a resist pattern; and the resist pattern is used to form a first contact hole at which the gate bus line is exposed by removing the protective film and the insulation film and to form a second contact hole at which the gate bus line terminal is exposed by removing the protective film, the resist pattern above the second contact hole being formed with a thickness smaller than the thickness of the resist pattern in other regions.
申请公布号 US2005170290(A1) 申请公布日期 2005.08.04
申请号 US20040848610 申请日期 2004.05.18
申请人 FUJITSU DISPLAY TECHNOLOGIES CORPORATION 发明人 DEJIMA YOSHIO
分类号 G02F1/1368;G02F1/135;G02F1/136;G02F1/1362;G03F7/00;G03F7/20;G09F9/00;H01L21/00;H01L21/027;H01L21/336;H01L21/768;H01L29/786;(IPC1-7):G03F7/00 主分类号 G02F1/1368
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