发明名称 PLASMA TREATMENT APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus capable of accurately determining the arrival of the timing of appropriate maintenance necessary for optimally maintaining the operation state of the apparatus. <P>SOLUTION: A discharge detection sensor 23 combining a dielectric member 21 and a probe electrode unit 22 is attached into an opening 2a disposed in a lid 2 composing a vacuum chamber to receive a potential change caused in a probe electrode 22b depending on the change of plasma discharge; and the necessity of maintenance is determined by comparing a count rate which is the number of times of detection of a V-type waveform with a specific V-shaped pattern due to leak discharge correlating with adhesion of foreign materials in the vacuum chamber by a V-type waveform detector 35 by a leak discharge waveform counter 39, with a tolerance beforehand set by a maintenance determination portion 44. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009048880(A) 申请公布日期 2009.03.05
申请号 JP20070214321 申请日期 2007.08.21
申请人 PANASONIC CORP 发明人 MIZUKAMI TATSUHIRO;ARITA KIYOSHI;NONOMURA MASARU
分类号 H05H1/46;H01L21/3065;H05H1/00 主分类号 H05H1/46
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