发明名称 |
PLASMA TREATMENT APPARATUS |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus capable of accurately determining the arrival of the timing of appropriate maintenance necessary for optimally maintaining the operation state of the apparatus. <P>SOLUTION: A discharge detection sensor 23 combining a dielectric member 21 and a probe electrode unit 22 is attached into an opening 2a disposed in a lid 2 composing a vacuum chamber to receive a potential change caused in a probe electrode 22b depending on the change of plasma discharge; and the necessity of maintenance is determined by comparing a count rate which is the number of times of detection of a V-type waveform with a specific V-shaped pattern due to leak discharge correlating with adhesion of foreign materials in the vacuum chamber by a V-type waveform detector 35 by a leak discharge waveform counter 39, with a tolerance beforehand set by a maintenance determination portion 44. <P>COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2009048880(A) |
申请公布日期 |
2009.03.05 |
申请号 |
JP20070214321 |
申请日期 |
2007.08.21 |
申请人 |
PANASONIC CORP |
发明人 |
MIZUKAMI TATSUHIRO;ARITA KIYOSHI;NONOMURA MASARU |
分类号 |
H05H1/46;H01L21/3065;H05H1/00 |
主分类号 |
H05H1/46 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|