| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for mass-producing a semiconductor particulate while suppressing, in advance, an unfavorable reaction before the semiconductor raw material is charged into a reaction vessel. SOLUTION: This method is characterized in that a compound semiconductor superfine particulate is produced by a hot soap process while independently feeding a raw material including the elements of the 11th to 13th group in the periodic table and that including the elements of the 15th to 17th group into a tubular flow reactor. COPYRIGHT: (C)2003,JPO
|
