| 发明名称 |
THIN FILM DEPOSITION APPARATUS |
| 摘要 |
A thin film deposition apparatus, including a processing chamber; a boat in the processing chamber, the boat to accommodate a plurality of substrates therein; and a nozzle to supply a source gas to the processing chamber to form a thin film on each of the substrates, the nozzle including a plurality of T-shaped nozzle pipes, each of the T-shaped nozzle pipes including a first pipe having closed ends and a second pipe coupled to a middle portion of the first pipe. |
| 申请公布号 |
US2017051409(A1) |
申请公布日期 |
2017.02.23 |
| 申请号 |
US201615164915 |
申请日期 |
2016.05.26 |
| 申请人 |
NOH Young Jin;SON Dong Min;CHOE Jae Myung;AHN Jae Young;YANG Cheol Kyu |
发明人 |
NOH Young Jin;SON Dong Min;CHOE Jae Myung;AHN Jae Young;YANG Cheol Kyu |
| 分类号 |
C23C16/455;C23C16/458 |
主分类号 |
C23C16/455 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A thin film deposition apparatus, comprising:
a processing chamber; a boat in the processing chamber, the boat to accommodate a plurality of substrates therein; and a nozzle to supply a source gas to the processing chamber to form a thin film on each of the substrates, the nozzle including a plurality of T-shaped nozzle pipes, each of the T-shaped nozzle pipes including a first pipe having closed ends and a second pipe coupled to a middle portion of the first pipe. |
| 地址 |
Suwon-si KR |
