发明名称 高抵抗材料の製造方法
摘要 PROBLEM TO BE SOLVED: To provide a high-resistive material including new impurity-doped gallium nitride.SOLUTION: A high resistive material of according to the invention consists of manganese-doped gallium nitride crystal (Mn doped GaN), of which resistivity measured by Hall measurement is 100 &OHgr;/cm or higher. This high-resistive material is suitable for high-frequency device because of the high resistivity thereof. In the high-resistive material, manganese doped amount is preferably 1×10atoms/cmor higher. This high-resistive material is preferably produced with a flux method. The flux method is one of the liquid-phase methods, and for gallium nitride, compared with a gas phase method, temperatures and pressures necessary for growing the gallium nitride may be eased by using metallic sodium.
申请公布号 JP6006852(B2) 申请公布日期 2016.10.12
申请号 JP20150182504 申请日期 2015.09.16
申请人 日本碍子株式会社 发明人 岩井 真;東原 周平
分类号 C30B29/38 主分类号 C30B29/38
代理机构 代理人
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