| 摘要 |
An antireflection film with excellent wear resistance, a lens and an imaging device are provided. On the surface of an optical substrate (11), a hydrogenated carbon film (17) is formed as a first layer (12) which functions as a high refractive index layer. On the first layer (12), a MgF2 layer (18) having a lower refractive index than that of the first layer (12) is formed as a second layer (13) which functions as a low refractive index layer. Similarly, a third layer (14) comprising a hydrogenated carbon film (17), a fourth layer (15) comprising a MgF2 film (18), and a fifth layer (16) comprising a hydrogenated carbon film (17) are formed. The hydrogenated carbon film (17) and the MgF2 film (18) are deposited using an RF magnetron sputter device. During deposition of the hydrogenated carbon film (17), a gas mixture of argon and hydrogen is supplied into a vacuum tank (22) to replace a portion of the C-C bonds in the film with C-H bonds. By means of the C-H bonds, a low refractive index antireflection film (10) with excellent wear resistance and adhesion properties can be obtained. |
