| 发明名称 |
SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD |
| 摘要 |
Disclosed is a substrate treatment apparatus. A substrate treatment apparatus comprises: a substrate support member for supporting a substrate; a liquid chemical supply member for intermittently supplying liquid chemical to the substrate; and a substrate heating member for heating the substrate. |
| 申请公布号 |
WO2016032242(A1) |
申请公布日期 |
2016.03.03 |
| 申请号 |
WO2015KR08951 |
申请日期 |
2015.08.26 |
| 申请人 |
ZEUS CO., LTD. |
发明人 |
JUNG, KWANG IL;LEE, BYEONG SU;RYU, JOO HYUNG |
| 分类号 |
H01L21/324;H01L21/02;H01L21/683 |
主分类号 |
H01L21/324 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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