PHOTOLITHOGRAPHIC METHODS

摘要

Provided are photoresist overcoat compositions, substrates coated with the overcoat compositions and methods of forming electronic devices by a negative tone development process. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.

主权项

1. A method of forming an electronic device, comprising:
(a) providing a semiconductor substrate comprising one or more layers to be patterned; (b) forming a photoresist layer over the one or more layers to be patterned; (c) coating a photoresist overcoat composition over the photoresist layer, wherein the overcoat composition comprises a basic quencher, a polymer and an organic solvent; (d) baking the photoresist overcoat composition to form a layer having a water receding contact angle of from 70 to 85°; (e) exposing the photoresist layer to actinic radiation; and (f) developing the exposed photoresist layer with an organic solvent developer.