发明名称 METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY DEVICE
摘要 The present invention provides a method for manufacturing a liquid crystal display device, which hardly causes display unevenness in joining parts in which mutually neighboring exposure regions are overlapped upon carrying out a photo-alignment treatment for forming a horizontal alignment film. The method for manufacturing a liquid crystal display device of the present invention includes a step of forming a horizontal alignment film by carrying out a photo-alignment treatment of irradiating a photo-alignment film material applied to at least one substrate of a pair of substrates with polarized light, wherein the photo-alignment treatment is carried out by exposure to a plurality of regions of one substrate surface; two neighboring regions among the plurality of regions to be exposed include an overlapped part; an irradiation amount of the polarized light to the overlapped part is gradually lowered in one of the two neighboring regions toward the other of the two neighboring regions; and the overlapped part of the two neighboring regions has a width of 20 mm or wider.
申请公布号 US2015268516(A1) 申请公布日期 2015.09.24
申请号 US201514731485 申请日期 2015.06.05
申请人 Sharp Kabushiki Kaisha 发明人 MIYACHI Koichi;MIYAKE Isamu
分类号 G02F1/1337 主分类号 G02F1/1337
代理机构 代理人
主权项 1. A method for manufacturing a liquid crystal display device comprising: a step of forming a horizontal alignment film by carrying out a photo-alignment treatment of irradiating a photo-alignment film material applied to at least one substrate of a pair of substrates with polarized light, wherein the photo-alignment treatment is carried out by exposure to a plurality of regions of one substrate surface, two neighboring regions among the plurality of regions to be exposed include an overlapped part, an irradiation amount of the polarized light to the overlapped part is gradually lowered in one of the two neighboring regions toward the other of the two neighboring regions, and the overlapped part of the two neighboring regions has a width of 20 mm or wider.
地址 Osaka JP