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发明名称
マイクロエレクトロニクス半製品を処理する装置および方法
摘要
<p>The present invention provides a tool for treating microelectronic workpieces with one or more treatment materials, including liquids, gases, fluidized solids, dispersions, combinations of these, and the like.</p>
申请公布号
JP5718951(B2)
申请公布日期
2015.05.13
申请号
JP20130000167
申请日期
2013.01.04
申请人
发明人
分类号
H01L21/304
主分类号
H01L21/304
代理机构
代理人
主权项
地址
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