发明名称 CONTACTING/LEAVING MECHANISM, AND IMAGE FORMATION APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a contacting/leaving mechanism capable of suppressing staining on and damage to a sensor detection surface.SOLUTION: A contacting/leaving mechanism includes: operation means of moving a first member 16 having a sensor detection surface 16a to and away from a second member; and shield means 40 of shielding the sensor detection surface 16a of the first member 16; and the operation means can be switched between a first position and a second position, and configured to arrange the first member 16 at an approach position close to the second member when the operation means is switched to the first position and to put the first member 16 away from the second member to a shielding position where the sensor detection surface 16a is shielded by the shield means 40 when the operation means is switched to the second position.
申请公布号 JP2014013361(A) 申请公布日期 2014.01.23
申请号 JP20120227939 申请日期 2012.10.15
申请人 RICOH CO LTD 发明人 SHIGA YUKI;KONUMA KIYOSHI;YAMAZAKI KOZO;TANAKA KIMIHIRO
分类号 G03G15/16 主分类号 G03G15/16
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